Company Filing History:
Years Active: 2007
Title: Renate Fechner: Pioneering Innovations in Micro-Lithography
Introduction
Renate Fechner, an accomplished inventor based in Leipzig, Germany, is making significant strides in the field of micro-lithography. With her innovative approach to substrate manufacturing, Fechner has contributed to advancements that are crucial for the semiconductor industry, particularly in extreme ultraviolet (EUV) lithography processes.
Latest Patents
Renate Fechner holds a patent for a "Substrate for the micro-lithography and process of manufacturing thereof." This invention focuses on developing a substrate that is especially suitable for EUV micro-lithography. The substrate features a base layer made of a material with a low coefficient of thermal expansion (CTE), which is then overlaid with at least one semiconductor cover layer. This cover layer is ideally a silicon layer, applied through ion beam sputtering. The invention also includes an additional ion beam figuring treatment to produce substrates of highly accurate shape and extremely low roughness.
Career Highlights
Fechner's career is marked by her dedication to research and innovation in the semiconductor field. Working at Schott AG, she has leveraged her expertise to enhance the capabilities of micro-lithography, directly impacting the production of advanced electronic devices. Her singular patent showcases her ability to address complex challenges in substrate manufacturing and highlights her innovative spirit.
Collaborations
Throughout her career, Renate Fechner has collaborated with notable colleagues, including Lutz Aschke and Markus Schweizer. These collaborations have allowed her to expand her expertise and contribute to significant advancements in their collective fields. Working closely with these professionals has fostered an environment of creativity and innovation, leading to the development of cutting-edge technologies in micro-lithography.
Conclusion
Renate Fechner's contributions to the field of micro-lithography as an inventor and her patent for a specialized substrate underscore her vital role in the advancement of semiconductor technologies. Her work at Schott AG, coupled with her collaborations, reflects her commitment to innovation and excellence in manufacturing processes. As the demand for more advanced micro-lithography techniques grows, Fechner’s inventions are likely to play a critical role in shaping the future of the semiconductor industry.