Paris, France

Renée Claude

This inventor holds 1 USPTO granted patent. Top assignee: U.S. Philips Corporation. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Renée Claude. Retrieved from https://idiyas.com/inventor/renandeacutee-claude

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Renée Claude: Innovator in Spin-Transition Technologies

Introduction

Renée Claude is a notable inventor based in Paris, France. He has made significant contributions to the field of technology, particularly in methods and devices that involve writing, storing, and erasing information. His innovative work has led to the development of a unique active medium containing at least one spin-transition parent compound.

Latest Patents

Renée Claude holds 1 patent for his invention titled "Methods and devices having means for writing storing and erasing which comprise an active medium containing at least one spin-transition parent compound." This patent showcases his expertise in advanced materials and their applications in information technology.

Career Highlights

Renée Claude is currently employed at U.S. Philips Corporation, where he continues to push the boundaries of innovation. His work at this esteemed company has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of his notable coworkers include Françoise Groliere and Charlotte Jay. Their combined efforts contribute to the advancement of technology and innovation within their projects.

Conclusion

Renée Claude's contributions to the field of technology through his patent and work at U.S. Philips Corporation highlight his role as an influential inventor. His innovative spirit continues to inspire advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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