Rena Mukaiyama

Title: Rena Mukaiyama: Innovator in Lithographic Printing Technology

Introduction

Rena Mukaiyama is a prominent inventor based in Shizuoka, Japan. She has made significant contributions to the field of lithographic printing technology. With a total of 4 patents to her name, her work has advanced the methods and materials used in this industry.

Latest Patents

Mukaiyama's latest patents include a positive type lithographic printing plate precursor and methods for producing and preparing lithographic printing plates. The precursor features a support with a hydrophilic surface or layer, along with an underlayer, interlayer, and upper layer. The underlayer contains a polymer compound with structures such as urethane bonds, while the interlayer includes polymer compounds with sulfonamide groups. The upper layer is characterized by a phenolic hydroxy group, and some layers contain an infrared absorbent. Additionally, her patents cover a photosensitive resin composition that incorporates a polymer compound with a specific linking group and an infrared absorbing material.

Career Highlights

Mukaiyama is currently employed at Fujifilm Corporation, where she continues to innovate in the field of lithographic printing. Her work has been instrumental in developing new materials and methods that enhance the efficiency and quality of printing processes.

Collaborations

Mukaiyama collaborates with Atsuyasu Nozaki, a talented woman in the same field. Their partnership has led to advancements in lithographic technologies and has contributed to the success of their projects.

Conclusion

Rena Mukaiyama's contributions to lithographic printing technology are noteworthy. Her innovative patents and collaborations reflect her commitment to advancing this field. Her work continues to influence the industry positively.