Ren Liu

Title: Ren Liu: Innovator in Plasma Technology

Introduction

Ren Liu is a notable inventor based in Sunnyvale, CA (US). He has made significant contributions to the field of plasma technology, holding 2 patents that showcase his innovative approach to engineering solutions.

Latest Patents

One of Ren Liu's latest patents is titled "Elongated capacitively coupled plasma source for high temperature low pressure environments." This patent describes a modular plasma source assembly designed for use with a processing chamber. The assembly features an RF hot electrode with an end dielectric and a sliding ground connection positioned adjacent to the sides of the electrode. A seal foil connects the sliding ground connection to the housing, providing a grounded sliding ground connection that is separated from the hot electrode by the end dielectric. Additionally, a coaxial feed line passes through a conduit into the RF hot electrode, which is isolated from the processing environment. This design ensures that the coaxial RF feed line operates at atmospheric pressure while the plasma processing region is maintained at reduced pressure.

Career Highlights

Ren Liu is currently employed at Applied Materials, Inc., where he continues to develop innovative technologies in the field of plasma processing. His work has been instrumental in advancing the capabilities of plasma sources used in various industrial applications.

Collaborations

Throughout his career, Ren has collaborated with esteemed colleagues such as John C. Forster and Joseph Yudovsky. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies.

Conclusion

Ren Liu is a prominent figure in the field of plasma technology, with a focus on creating advanced solutions for high temperature and low pressure environments. His contributions through patents and collaborations highlight his commitment to innovation and excellence in engineering.