The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2016
Filed:
Aug. 15, 2014
John C. Forster, Mountain View, CA (US);
Joseph Yudovsky, Campbell, CA (US);
Garry K. Kwong, San Jose, CA (US);
Tai T. Ngo, Dublin, CA (US);
Kevin Griffin, Livermore, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Ren Liu, Sunnyvale, CA (US);
John C. Forster, Mountain View, CA (US);
Joseph Yudovsky, Campbell, CA (US);
Garry K. Kwong, San Jose, CA (US);
Tai T. Ngo, Dublin, CA (US);
Kevin Griffin, Livermore, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Ren Liu, Sunnyvale, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A modular plasma source assembly for use with a processing chamber is described. The assembly includes an RF hot electrode with an end dielectric and a sliding ground connection positioned adjacent the sides of the electrode. A seal foil connects the sliding ground connection to the housing to provide a grounded sliding ground connection separated from the hot electrode by the end dielectric. A coaxial feed line passes through a conduit into the RF hot electrode isolated from the processing environment so that the coaxial RF feed line is at atmospheric pressure while the plasma processing region is at reduced pressure.