Neeritter, Netherlands

Remco Johannes Elisa Heijmans

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Remco Johannes Elisa Heijmans: Innovator in EUV Lithography Technology

Introduction

Remco Johannes Elisa Heijmans is a notable inventor based in Neeritter, Netherlands. He is recognized for his contributions to the field of lithography, particularly in the development of advanced radiation sources for EUV lithography apparatuses. His innovative work has significant implications for the semiconductor manufacturing industry.

Latest Patents

Heijmans holds a patent for a "Radiation conduit," which describes a radiation source for an EUV lithography apparatus. This patent outlines a chamber that includes a plasma formation region and a radiation collector designed to gather radiation emitted from the plasma formation region. The collected radiation is directed towards an intermediate focus region through a radiation conduit. This conduit features at least one outlet on its inner surface for directing a protective gas flow, along with guide portions that help redirect this flow. The patent also details a method for reducing debris and vapor deposition within the radiation conduit by utilizing a protective gas flow.

Career Highlights

Heijmans is currently employed at ASML Netherlands B.V., a leading company in the development of photolithography equipment used in the semiconductor industry. His work at ASML has positioned him as a key player in advancing lithography technology, which is crucial for producing smaller and more efficient electronic components.

Collaborations

Heijmans has collaborated with notable colleagues such as Gerrit Van Der Straaten and Ivo Vanderhallen. These collaborations have contributed to the innovative advancements in lithography technology and have fostered a productive research environment.

Conclusion

Remco Johannes Elisa Heijmans is a significant figure in the field of EUV lithography, with a patent that showcases his innovative approach to radiation sources. His work at ASML and collaborations with esteemed colleagues highlight his impact on the semiconductor industry.

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