Yokohama, Japan

Reiko Otomo

This inventor holds 1 USPTO granted patent. Top assignee: Tosoh Corporation. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Reiko Otomo. Retrieved from https://idiyas.com/inventor/reiko-otomo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Reiko Otomo: Innovator in Protective Coating Materials

Introduction

Reiko Otomo is a prominent inventor based in Yokohama, Japan. She has made significant contributions to the field of protective coating materials. Her innovative work has led to the development of a unique protective coating material that utilizes (meth)acrylate derivatives.

Latest Patents

Reiko holds a patent for a protective coating material comprising (meth)acrylate derivatives of specific formulas. This material is designed to enhance durability and protection in various applications. Her patent includes a detailed composition that specifies the ranges of a, b, c, d, and e % by weight.

Career Highlights

Reiko is currently employed at Tosoh Corporation, where she continues to advance her research and development efforts. Her work at the company has positioned her as a key player in the innovation of coating technologies.

Collaborations

Reiko collaborates with talented colleagues, including Yosuke Takahashi and Yasuhiko Shida. Together, they work on various projects that aim to push the boundaries of material science.

Conclusion

Reiko Otomo's contributions to protective coating materials exemplify her dedication to innovation in the field. Her patent and ongoing work at Tosoh Corporation highlight her role as a leading inventor in this specialized area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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