Reiko Moriya

Title: Reiko Moriya: Innovator in Coating Technology

Introduction

Reiko Moriya is a prominent inventor based in Kanagawa, Japan, known for her significant contributions to coating technology. With a total of seven patents to her name, she has made remarkable advancements in the field of dispersion slurry coating methods.

Latest Patents

One of her latest patents is a method and apparatus for pattern-coating. This innovative method involves coating a dispersion slurry containing a solid superabsorbent polymer (SAP) on the surface of a substrate sheet. The technique is characterized by the formation of a convex-and-concave pattern on the substrate, where the first region has a thicker coating layer, while the second region has a thinner layer or may not have a coating at all. This is achieved by positioning a rotating pattern roll over the substrate sheet via a cover film, supplying the dispersion slurry between the substrate and the cover film, and pushing the coating layer with the rotating roll.

Career Highlights

Throughout her career, Reiko has worked with notable organizations such as the Japan Absorbent Technology Institute and Dsg International Limited. Her work in these institutions has allowed her to refine her skills and contribute to the development of innovative coating technologies.

Collaborations

Reiko has collaborated with several professionals in her field, including Migaku Suzuki and Toa Kobayashi. These collaborations have further enhanced her research and development efforts in coating technology.

Conclusion

Reiko Moriya's contributions to the field of coating technology through her innovative patents and collaborations highlight her role as a leading inventor. Her work continues to influence advancements in the industry, showcasing the importance of innovation in technology.