Company Filing History:
Years Active: 2005
Title: Reiko Kakita: Innovating Photolithography in Tokyo
Introduction
Reiko Kakita, an inventive mind based in Tokyo, Japan, has made significant contributions to the field of photolithography. With a focus on the development of advanced materials for manufacturing, Kakita has successfully secured a patent that enhances the efficiency of photolithographic processes.
Latest Patents
Kakita's notable patent revolves around a pellicle utilized in photolithographic patterning, specifically designed for light wavelengths ranging from 100 to 200 nm. This innovative pellicle contains a membrane comprised of a substantially linear fluoropolymer, characterized by an alicyclic structure in its main chain. The unique composition of the fluoropolymer ensures optimal performance in photolithography, satisfying specific chemical requirements that enhance its functionality in industrial applications.
Career Highlights
Reiko Kakita is a talented inventor currently employed at Asahi Glass Company, Limited, where he plays a crucial role in developing cutting-edge materials for various applications. His expertise in materials science and engineering has positioned him as a valuable asset to his organization.
Collaborations
Throughout his career, Kakita has collaborated with notable colleagues, including Ikuo Matsukura and Naoko Shirota. This teamwork highlights not only his ability to work alongside other skilled professionals but also the synergy that enhances their collective output in research and innovation.
Conclusion
Reiko Kakita stands as a testament to the innovative spirit within the realm of photolithography. His patent on the pellicle has not only advanced technological processes but has also set new standards in material science. With his ongoing work at Asahi Glass Company, Limited, Kakita continues to contribute to the dynamic field of innovations, paving the way for future advancements in technology.