The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2005
Filed:
Aug. 06, 2003
Ikuo Matsukura, Yokohama, JP;
Naoko Shirota, Yokohama, JP;
Nana Tsushima, Yokohama, JP;
Kiyoshi Yamamoto, Yokohama, JP;
Reiko Kakita, Tokyo, JP;
Ikuo Matsukura, Yokohama, JP;
Naoko Shirota, Yokohama, JP;
Nana Tsushima, Yokohama, JP;
Kiyoshi Yamamoto, Yokohama, JP;
Reiko Kakita, Tokyo, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
A pellicle is used for a photolithographic patterning process using a light having a wavelength of from 100 to 200 nm. The pellicle contains a pellicle membrane containing (A) a substantially linear fluoropolymer which has an alicyclic structure in its main chain, the main chain being a chain of carbon atoms, and the fluropolymer satisfying the following requirements (1) the carbon atoms in the main chain of the fluoropolymer contain a carbon atom having at least one hydrogen atom bonded thereto and a carbon atom having no hydrogen atom bonded thereto; and (2) in the measurement of a high resolution proton magnetic resonance spectrum of the fluoropolymer, a number of hydrogen atoms based on signals appearing on the higher magnetic field side higher than 2.8 ppm, is at most 6 mol % based on a total number of hydrogen atoms.