Company Filing History:
Years Active: 2005
Title: Nana Tsushima: Innovator in Photolithographic Technology
Introduction
Nana Tsushima is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of photolithography, particularly through his innovative patent related to pellicles.
Latest Patents
Tsushima holds one patent for a pellicle used in a photolithographic patterning process. This pellicle is designed to work with light wavelengths ranging from 100 to 200 nm. The pellicle features a membrane made from a substantially linear fluoropolymer that contains an alicyclic structure in its main chain. The fluoropolymer meets specific requirements, including the presence of carbon atoms with and without hydrogen atoms bonded to them. Additionally, in high-resolution proton magnetic resonance spectrum measurements, the number of hydrogen atoms based on signals appearing on the higher magnetic field side higher than 2.8 ppm is at most 6 mol % based on the total number of hydrogen atoms.
Career Highlights
Tsushima is currently employed at Asahi Glass Company, Limited, where he continues to work on advancements in materials for photolithography. His expertise in this area has positioned him as a valuable asset to his company and the industry.
Collaborations
Some of Tsushima's coworkers include Ikuo Matsukura and Naoko Shirota, who contribute to the innovative environment at Asahi Glass Company, Limited.
Conclusion
Nana Tsushima's work in developing advanced pellicles for photolithography showcases his innovative spirit and dedication to enhancing technology in the field. His contributions are significant and continue to influence the industry.