Reiko Iwata

Title: Reiko Iwata: Innovator in Infrared Light Technology

Introduction

Reiko Iwata is a prominent inventor based in Taito-ku, Japan. She has made significant contributions to the field of imaging technology, particularly through her innovative work on infrared light cut filters. Her expertise and dedication to her craft have led to the development of a patented method that enhances the performance of solid-state imaging devices.

Latest Patents

Reiko Iwata holds a patent for a "Method for producing infrared light cut filter, filter for solid-state imaging device, and solid-state imaging device." This patent outlines a comprehensive method for producing an infrared light cut filter. The process includes forming an infrared light cut layer with an infrared light absorbing dye, applying a protective layer, and patterning the layers through dry etching. This innovative approach ensures the durability and effectiveness of the filter in imaging applications.

Career Highlights

Reiko Iwata is currently employed at Toppan Inc., a leading company in the printing and imaging industry. Her work at Toppan has allowed her to collaborate with other talented professionals, further advancing the field of imaging technology. Her contributions have not only enhanced the company's product offerings but have also set new standards in the industry.

Collaborations

Reiko has worked alongside notable colleagues such as Yuri Nagai and Yasutake Akeno. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas. Together, they have contributed to the development of cutting-edge technologies that benefit the imaging sector.

Conclusion

Reiko Iwata's innovative work in the field of infrared light technology exemplifies her commitment to advancing imaging solutions. Her patented methods and collaborations with esteemed colleagues highlight her significant impact on the industry. Reiko continues to inspire future generations of inventors and innovators.