The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2025

Filed:

Jun. 23, 2022
Applicant:

Toppan Inc., Tokyo, JP;

Inventors:

Reiko Iwata, Taito-ku, JP;

Yuri Nagai, Taito-ku, JP;

Yasutake Akeno, Taito-ku, JP;

Assignee:

TOPPAN Inc., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/20 (2006.01); G02B 1/04 (2006.01); G02B 1/14 (2015.01); G02B 5/22 (2006.01); H10F 39/00 (2025.01);
U.S. Cl.
CPC ...
G02B 5/208 (2013.01); G02B 1/04 (2013.01); G02B 1/14 (2015.01); G02B 5/22 (2013.01); H10F 39/024 (2025.01); H10F 39/8063 (2025.01);
Abstract

A method for producing an infrared light cut filter, including forming an infrared light cut layer comprising an infrared light absorbing dye, forming a protective layer on the infrared light cut layer which provides protection against a stripping solution, forming a resist pattern on the protective layer, patterning the protective layer and the infrared light cut layer by dry etching based on the resist pattern, and removing the resist pattern from the protective layer by applying the stripping solution.


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