Company Filing History:
Years Active: 2025
Title: Reijiro Shimura: Innovator in Ferroelectric Film Technology
Introduction
Reijiro Shimura is a prominent inventor based in Tokyo, Japan. He is known for his significant contributions to the field of ferroelectric materials. His innovative work has led to advancements in the production of ferroelectric films, which have various applications in electronics.
Latest Patents
Reijiro Shimura holds a patent for a method for producing ferroelectric film, ferroelectric film, and usage thereof. This patent describes a method for forming a ferroelectric film of a metal oxide with a fluorite-type structure at a low temperature of less than 300° C. The invention provides a production method that involves using a film sputtering technique at a substrate temperature below 300° C. This allows for the deposition of a metal oxide film capable of achieving a fluorite-type structure. The resulting ferroelectric film can be formed on various substrates, including organic materials, glass, or metal, and is suitable for low-temperature applications.
Career Highlights
Reijiro Shimura is affiliated with the Tokyo Institute of Technology, where he continues to engage in research and development in the field of materials science. His work has garnered attention for its potential to enhance the performance of electronic devices through the use of ferroelectric films.
Collaborations
He has collaborated with notable colleagues, including Hiroshi Funakubo and Takao Shimizu, who share his passion for advancing technology in the field of ferroelectric materials.
Conclusion
Reijiro Shimura's contributions to the development of ferroelectric films represent a significant advancement in materials science. His innovative methods and collaborative efforts continue to influence the future of electronic applications.