Fuji, Japan

Reijiro Sato


Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 29(Granted Patents)


Company Filing History:


Years Active: 1987-1994

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2 patents (USPTO):Explore Patents

Title: Reijiro Sato: Innovator in Photosensitive Resin Technology

Introduction

Reijiro Sato is a notable inventor based in Fuji, Japan. He has made significant contributions to the field of photosensitive resin compositions, holding 2 patents that showcase his innovative approach to material science.

Latest Patents

Sato's latest patents include a photosensitive resin composition designed for forming a relief structure. This composition comprises a liquid photosensitive resin component, which includes a urethane prepolymer and an addition-polymerizable ethylenically unsaturated monomer. It also contains a photopolymerization initiator, a thermal polymerization inhibitor, and a specific unsaturated amine compound. This innovative resin composition exhibits excellent performance, avoiding the tunnel phenomenon commonly observed in conventional photosensitive resin compositions. The resulting photoresin relief structure is characterized by a tunnel-free design and superior mechanical properties. Another patent focuses on improving the surface tack-free characteristics of a photosensitive resin composition after curing through exposure to actinic radiation. This patent also discloses a method for preparing a surface-tack free photocured pattern structure, enabling the production of improved pattern structures in a shorter time frame.

Career Highlights

Throughout his career, Reijiro Sato has worked with prominent companies, including Asahi Kasei Corporation. His experience in these organizations has allowed him to refine his expertise in the development of advanced materials.

Collaborations

Sato has collaborated with notable colleagues such as Kuniaki Minonishi and Gensho Takahashi, contributing to the advancement of technology in their field.

Conclusion

Reijiro Sato's innovative work in photosensitive resin technology has led to significant advancements in material science. His patents reflect a commitment to improving the performance and characteristics of resin compositions, making a lasting impact in the industry.

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