Rebecca Y Tang

Title: The Innovative Contributions of Rebecca Y Tang

Introduction

Rebecca Y Tang is a notable inventor based in Anaheim, CA. She has made significant contributions to the field of semiconductor technology, particularly in the area of metal-oxide-semiconductor (MOS) fabrication. Her work has been instrumental in advancing the efficiency and effectiveness of multilevel MOS wafers.

Latest Patents

Rebecca holds a patent for a "Planarization process for double metal MOS using spin-on glass." This innovative method provides a planar or iso-planar surface to the interlevel dielectric layer between metal layers of a multilevel MOS wafer. The process involves applying a first dielectric over the first metal layer, followed by a layer of spin-on glass. The spin-on glass layer is then etched in a manner that matches the etch rate of the first dielectric, revealing portions of the dielectric layer. A second dielectric layer is subsequently placed over the first dielectric, allowing for the definition of vias and the application of a second metal layer over a smooth surface.

Career Highlights

Rebecca is currently employed at Rockwell International Corporation, where she continues to innovate and contribute to the field of semiconductor technology. Her work has garnered attention for its practical applications in improving the manufacturing processes of MOS devices.

Collaborations

Rebecca has collaborated with esteemed colleagues such as Patricia C Elkins and Yau-Wai D Chan. These partnerships have fostered a collaborative environment that enhances the development of innovative solutions in their field.

Conclusion

Rebecca Y Tang's contributions to semiconductor technology exemplify the impact of innovative thinking in engineering. Her patent and work at Rockwell International Corporation highlight her role as a leading inventor in the industry.