Brookfield, CT, United States of America

Rebecca E Carvell

This inventor holds 1 USPTO granted patent. Top assignee: Pitney Bowes Inc.. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rebecca E Carvell. Retrieved from https://idiyas.com/inventor/rebecca-e-carvell

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Innovations by Rebecca E Carvell

Introduction

Rebecca E Carvell is an accomplished inventor based in Brookfield, CT (US). She has made significant contributions to the field of secure environments through her innovative methods. Her work focuses on enhancing access control and authentication processes.

Latest Patents

Rebecca holds a patent for a "Method of authenticating membership for providing access to a secure environment by authenticating membership to an associated secure environment." This invention provides a way to access a secure environment based on the right to access another secure environment. The method allows for authentication of claimants for providing access to several secure environments based on access to a first secure environment.

Career Highlights

Rebecca is currently employed at Pitney Bowes Inc., where she continues to develop her innovative ideas. Her work has been instrumental in improving security protocols and access management systems.

Collaborations

Some of her notable coworkers include Melissa Cacace-Bailey and Andrei Obrea. Their collaboration has contributed to the advancement of various projects within the company.

Conclusion

Rebecca E Carvell's contributions to the field of secure environments through her innovative patent demonstrate her expertise and commitment to enhancing security measures. Her work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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