Milwaukee, WI, United States of America

Rebecca Anne Beier

This inventor holds 1 USPTO granted patent. Top assignee: Honda Motor Co., Ltd.. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rebecca Anne Beier. Retrieved from https://idiyas.com/inventor/rebecca-anne-beier

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: The Innovative Journey of Rebecca Anne Beier

Introduction

Rebecca Anne Beier is a notable inventor based in Milwaukee, WI (US). She has made significant contributions to the field of innovation, particularly with her patent for a reflector. Her work exemplifies the spirit of creativity and problem-solving that drives advancements in technology.

Latest Patents

Rebecca holds a patent for a reflector, showcasing her ability to develop practical solutions that can enhance various applications. This patent reflects her innovative mindset and dedication to improving existing technologies.

Career Highlights

Rebecca is currently employed at Honda Motor Co., Ltd., where she applies her expertise in engineering and design. Her role at Honda allows her to contribute to the development of cutting-edge automotive technologies. With her background and skills, she plays a vital part in the company's innovative projects.

Collaborations

Throughout her career, Rebecca has collaborated with talented individuals such as Asao Itaya and Damien B Basset. These partnerships have enabled her to expand her knowledge and enhance her contributions to the field of innovation.

Conclusion

Rebecca Anne Beier's journey as an inventor highlights her commitment to innovation and collaboration. Her work at Honda and her patent for a reflector demonstrate her significant impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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