This inventor holds 1 USPTO granted patent. Top assignee: The Chinese University of Hong Kong. Active years: 2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2011
Title: Innovations of Raymond W M Kwok
Introduction
Raymond W M Kwok is a notable inventor based in Hong Kong, CN. He has made significant contributions to the field of molecular science, particularly in the area of hydrogen removal from molecules. His innovative approach has led to the development of a unique method that has potential applications in various industries.
Latest Patents
Raymond W M Kwok holds a patent for a method titled "Method for selectively removing hydrogen from molecules." This patent describes a process where hydrogen-containing molecules are deposited on a solid substrate and bombarded with hydrogen projectile particles. The particles, which can have energies ranging from 5-100 eV, preferably between 10-50 eV, effectively remove hydrogen atoms from the deposited molecules while preserving other atoms. The resulting dangling bonds can be utilized to cross-link the molecules, leading to the creation of a nanometer-thick dense film.
Career Highlights
Raymond W M Kwok is affiliated with The Chinese University of Hong Kong, where he continues to engage in research and development. His work has garnered attention for its innovative approach to molecular manipulation and its potential implications in various scientific fields.
Collaborations
Raymond has collaborated with Woon Ming Lau, contributing to the advancement of their research initiatives. Their partnership has fostered a productive environment for exploring new methodologies in molecular science.
Conclusion
Raymond W M Kwok's contributions to the field of molecular science through his innovative patent demonstrate his commitment to advancing technology. His work not only showcases his expertise but also highlights the potential for future developments in this area.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
