Wilmington, DE, United States of America

Raymond Pong

This inventor holds 1 USPTO granted patent. Top assignee: Ii-Vi Delaware, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Raymond Pong. Retrieved from https://idiyas.com/inventor/raymond-pong-p2ekx0wc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Raymond Pong

Introduction

Raymond Pong is a notable inventor based in Wilmington, Delaware. He has made significant contributions to the field of technology, particularly in the area of ion beam generation. His work has implications for various applications, showcasing his expertise and innovative spirit.

Latest Patents

Raymond Pong holds a patent for "Systems and methods for aluminum ion beam generation source technology." This patent describes an implantation device that includes an ionization chamber with a cathode and a repeller. The device features a source of aluminum ions within the chamber, where a displacing gas is introduced during the ionization process to produce a beam of energetic aluminum ions. This invention represents a significant advancement in ion implantation technology.

Career Highlights

Raymond Pong is currently employed at Ii-Vi Delaware, Inc., where he continues to develop and refine his innovative ideas. His work at the company has allowed him to explore new technologies and contribute to advancements in the field.

Collaborations

Raymond has collaborated with talented coworkers, including Ahmet Hassan and Jeremy Turcaud. Their combined expertise fosters a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Raymond Pong's contributions to the field of ion beam generation technology highlight his role as an influential inventor. His patent and ongoing work at Ii-Vi Delaware, Inc. demonstrate his commitment to advancing technology and innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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