Lancaster, NY, United States of America

Raymond M Necci

This inventor holds 2 USPTO granted patents. Top assignee: Avox Systems Inc.. Active years: 2005-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Raymond M Necci. Retrieved from https://idiyas.com/inventor/raymond-m-necci

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2005-2007

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Innovations by Raymond M Necci

Introduction

Raymond M Necci is an accomplished inventor based in Lancaster, NY (US). He has made significant contributions to the field of technology, particularly in the design of devices that enhance user experience in specialized equipment. With a total of 2 patents to his name, Necci's work reflects his dedication to innovation and improvement.

Latest Patents

One of Necci's notable inventions is the Pivot Mask. This device is designed to rotate a previously unrotatable receiver used with helmets, specifically aircraft helmets. The Pivot Mask addresses a critical need for flexibility and usability in helmet design, enhancing the functionality for users in demanding environments.

Career Highlights

Necci has been associated with Avox Systems Inc., where he has applied his expertise in developing innovative solutions. His work at Avox Systems Inc. showcases his commitment to advancing technology in the aerospace sector.

Collaborations

Necci has collaborated with various professionals in his field, including his coworker Valentin A Castro. These collaborations have contributed to the successful development of his inventions and have fostered a creative environment for innovation.

Conclusion

Raymond M Necci's contributions to the field of invention, particularly with his Pivot Mask, highlight his role as a significant innovator in technology. His work continues to influence advancements in helmet design and user experience.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…