Cheshire, CT, United States of America

Raymond J Smialek


Average Co-Inventor Count = 2.7

ph-index = 5

Forward Citations = 76(Granted Patents)


Location History:

  • Lake Charles, LA (US) (1980)
  • Cheshire, CT (US) (1985 - 1998)

Company Filing History:


Years Active: 1980-1998

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8 patents (USPTO):Explore Patents

Title: Innovations of Raymond J Smialek

Introduction

Raymond J Smialek is a notable inventor based in Cheshire, CT (US). He has made significant contributions to the field of technology, holding a total of 8 patents. His work primarily focuses on processes and apparatuses that enhance the efficiency and quality of metal production.

Latest Patents

One of his latest patents is titled "Apparatus and a process for regenerating a CUCl.sub.2 etchant." This invention relates to an apparatus and a process for regenerating a used etchant solution that contains a metal in divalent form. The apparatus includes a tank originally supplied with the etchant solution, a first electrolytic cell for converting the solution from the tank to a solution containing a high fraction of a monovalent form of the metal, and a second electrolytic tank for plating metal from the solution containing a high fraction of the monovalent form of the metal. The details of this innovative process are thoroughly outlined in the patent disclosure.

Another significant patent is "Apparatus and process for the production of micro-pore free high." This invention describes a process and apparatus for producing metal foil. It involves supplying an isotopically polished continuous cathode, a high volume turbulent flow of electrolyte, and rigorous filtration to exclude chlorides, sulfides, organics, and other impurities from the electrolyte. The resulting foil is free from micro-voids and can withstand substantially higher biaxial stresses than conventional electrodeposited foil. The micro void-free structure also decreases the diffusion rate of an underlying substrate.

Career Highlights

Throughout his career, Raymond has worked with prominent companies such as Olin Corporation and Oxley Research, Inc. His experience in these organizations has contributed to his expertise in the field of metal production and etching processes.

Collaborations

Raymond has collaborated with notable individuals in his field, including Ned W Polan and Arvind Parthasarathi. These collaborations have likely enriched his work and led to further innovations.

Conclusion

Raymond J Smialek's contributions to the field of technology through his patents and collaborations highlight his innovative spirit and dedication to advancing metal production processes. His work continues to influence the industry and inspire future inventors.

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