Genoa, IL, United States of America

Raymond J Beckmann


 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2010-2013

Loading Chart...
Loading Chart...
2 patents (USPTO):Explore Patents

Title: Innovations of Raymond J Beckmann

Introduction

Raymond J Beckmann is an accomplished inventor based in Genoa, Illinois. He has made significant contributions to the field of electrical engineering, particularly in the development of advanced motor drive systems. With a total of two patents to his name, Beckmann's work showcases his expertise and innovative spirit.

Latest Patents

Beckmann's latest patents include a system for motor drive load damping and a method for re-engaging the start of a dynamoelectric machine. The motor drive load damping patent describes an electric power supply system that utilizes a damping algorithm to enhance the stability of power supplied to a motor. This system includes a control unit and a compensation block that optimizes the power delivery process. The second patent outlines a method for starting a gas turbine engine using a synchronous multiphase alternating current dynamoelectric machine. This method allows for the re-engagement of starting operations at non-zero rotor speeds, improving efficiency and performance.

Career Highlights

Beckmann is currently employed at Hamilton Sundstrand Corporation, where he continues to innovate and develop cutting-edge technologies. His work at the company has positioned him as a key player in the advancement of electrical power systems.

Collaborations

Throughout his career, Beckmann has collaborated with notable colleagues, including Donal E Baker and Curtis J Plude. These partnerships have contributed to the successful development of his patents and innovations.

Conclusion

Raymond J Beckmann's contributions to electrical engineering through his patents reflect his dedication to innovation and excellence. His work continues to influence the industry and pave the way for future advancements.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…