This inventor holds 1 USPTO granted patent. Top assignee: Jet Process Corporation. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Innovations of Raymond F Graves
Introduction
Raymond F Graves is an accomplished inventor based in Milford, CT (US). He has made significant contributions to the field of vapor deposition technology. His innovative methods have paved the way for advancements in material film applications.
Latest Patents
Graves holds a patent for a "Method for hydrogen atom assisted jet vapor deposition for parylene N." This method presents a novel approach for the vapor deposition of a material film upon a substrate. The process utilizes a Jet Vapor Deposition technique with a vaporized polymer gas flowing at supersonic velocity. The vaporized polymer gas, which consists of a carrier gas and a vaporized polymer such as Parylene, impinges upon the substrate through a port, forming the material film.
Career Highlights
Graves is associated with Jet Process Corporation, where he applies his expertise in vapor deposition technologies. His work has been instrumental in enhancing the efficiency and effectiveness of material film applications.
Collaborations
Graves collaborates with Bret L Halpern, contributing to the development of innovative solutions in their field.
Conclusion
Raymond F Graves continues to be a pivotal figure in the realm of vapor deposition technology, with his patented methods showcasing his innovative spirit and dedication to advancing material science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile