Washington, DC, United States of America

Raymond A Adomaitis

This inventor holds 2 USPTO granted patents. Top assignee: University System of Maryland. Active years: 2004-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Raymond A Adomaitis. Retrieved from https://idiyas.com/inventor/raymond-a-adomaitis

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 1.5

ph-index = 2

Forward Citations = 620(Granted Patents)


Company Filing History:


Years Active: 2004-2009

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2 patents (USPTO):Explore Patents

Title: Innovations by Raymond A Adomaitis

Introduction

Raymond A Adomaitis is a notable inventor based in Washington, DC. He has made significant contributions to the field of thin film processing, holding 2 patents that showcase his innovative approaches to enhancing uniformity in various deposition systems.

Latest Patents

One of his latest patents is titled "Method for controlling uniformity of thin films fabricated in processing systems." This method addresses the challenge of achieving spatial uniformity in thin film processing applicable to various film qualities and deposition systems. The technique involves identifying deposition profiles that produce uniform films under rotation and optimizing process parameters to minimize deviations from the Nearest Uniformity Producing Profile (NUPP).

Another significant patent is "Spatially programmable microelectronics process equipment using segmented gas injection showerhead with exhaust gas recirculation." This invention features a multizone, segmented showerhead that allows for controllable gas impingement flux distribution. This capability enhances uniformity in chemical vapor deposition and other processes, enabling rapid experimentation and optimization in both manufacturing and research settings.

Career Highlights

Raymond A Adomaitis is affiliated with the University System of Maryland, where he continues to contribute to advancements in microelectronics and thin film technologies. His work has been instrumental in improving the efficiency and effectiveness of various deposition processes.

Collaborations

Throughout his career, Adomaitis has collaborated with esteemed colleagues, including John N Kidder, Jr and Gary W Rubloff. These partnerships have fostered innovation and have led to significant advancements in their respective fields.

Conclusion

Raymond A Adomaitis exemplifies the spirit of innovation through his patents and contributions to thin film processing. His work continues to influence the field and drive advancements in microelectronics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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