Location History:
- Gilbert, AZ (US) (2002 - 2004)
- Mesa, AZ (US) (2002 - 2004)
Company Filing History:
Years Active: 2002-2004
Title: Ray Dubois: Innovator in Chemical Vapor Deposition Technologies
Introduction
Ray Dubois is a notable inventor based in Mesa, AZ (US), recognized for his contributions to the field of chemical vapor deposition (CVD) processes. With a total of 5 patents, Dubois has made significant advancements in the abatement of effluents generated during these processes. His work has implications for various industries, particularly in the development of thin films and materials.
Latest Patents
Dubois's latest patents include innovative methods and apparatuses aimed at improving the efficiency of effluent abatement from CVD processes. One of his notable patents focuses on the "Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions." This invention details a method for treating effluents to remove precursor species and by-products, utilizing a quartz microbalance detector to monitor breakthrough conditions. Another significant patent is the "Abatement of effluents from chemical vapor deposition processes using organometallic source reagents," which describes a high-efficiency abatement process for copper deposition involving specific precursor compositions.
Career Highlights
Ray Dubois is currently employed at Advanced Technology Materials, Inc., where he continues to develop and refine technologies related to CVD processes. His expertise in this area has positioned him as a key figure in advancing the efficiency and effectiveness of material deposition techniques.
Collaborations
Throughout his career, Dubois has collaborated with several professionals, including Mark R Holst and Rebecca Faller. These collaborations have contributed to the development of innovative solutions in the field of chemical vapor deposition.
Conclusion
Ray Dubois stands out as an influential inventor in the realm of chemical vapor deposition technologies. His patents and ongoing work at Advanced Technology Materials, Inc. reflect his commitment to advancing the field and addressing environmental challenges associated with effluent management.