Woburn, MA, United States of America

Ravi Nandigam

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Aspen Technology, Inc.. Active years: 2019.


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Innovations by Ravi Nandigam

Introduction

Ravi Nandigam is an accomplished inventor based in Woburn, MA (US). He has made significant contributions to the field of refinery planning through his innovative approaches. His work focuses on enhancing efficiency in industrial plants, particularly in the context of refining processes.

Latest Patents

Ravi Nandigam holds a patent for a "Runtime modeling approach to updating refinery planning models." This invention encompasses a method, apparatus, and computer program product designed to increase efficiency in a plant. The patent details a planning model that includes multiple runtime models stored in a database. Each runtime model corresponds to a reactor in the plant and mimics real-world behavior by identifying the mathematical relationships of the inputs and outputs of the reactor. The models also include tuning factors, allowing users to adjust them to align with desired outputs or account for real-life plant activities. By implementing these runtime models into a planning model, users can optimize product output and balance materials effectively.

Career Highlights

Ravi Nandigam is currently employed at Aspen Technology, Inc., where he continues to develop innovative solutions for the industry. His work has been instrumental in advancing the efficiency of refinery operations.

Collaborations

Ravi collaborates with notable colleagues, including Willie Chan and Marcelo Marchetti, who contribute to the innovative environment at Aspen Technology, Inc.

Conclusion

Ravi Nandigam's contributions to refinery planning through his patented innovations demonstrate his commitment to enhancing industrial efficiency. His work continues to impact the field positively.

Profile summary based on public USPTO records.
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