This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Ravi Komanduri: Innovator in Optical Metrology
Introduction
Ravi Komanduri is a notable inventor based in Milpitas, CA (US). He has made significant contributions to the field of optical metrology, particularly through his innovative patent. His work focuses on enhancing measurement systems that are crucial for various applications in technology and manufacturing.
Latest Patents
Ravi Komanduri holds a patent titled "Methods of geometry parameters measurement for optical gratings." This patent relates to metrology measurement systems and outlines a system that includes a substrate support and an optical arm. The optical arm is equipped with a light source that projects a beam along a designated light path. It also features a first lens, a first beam splitter, a second lens, a first detector, and an aperture. The configuration of these components allows for precise measurement of optical gratings, which is essential for ensuring accuracy in various optical applications. He has 1 patent to his name.
Career Highlights
Ravi Komanduri is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His role involves developing advanced metrology systems that enhance the precision of optical measurements. His expertise in this area has positioned him as a valuable asset to his team and the company.
Collaborations
Throughout his career, Ravi has collaborated with talented individuals such as Jinxin Fu and Yangyang Sun. These collaborations have fostered innovation and contributed to the advancement of optical measurement technologies.
Conclusion
Ravi Komanduri's work in optical metrology exemplifies the impact of innovative thinking in technology. His contributions through patents and collaborations continue to shape the future of measurement systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
