New Brunswick, NJ, United States of America

Ravi Chandran

This inventor holds 5 USPTO granted patents. Top assignee: Elisha Holding LLC. Active years: 2003-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ravi Chandran. Retrieved from https://idiyas.com/inventor/ravi-chandran-l54rxco2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.8

ph-index = 4

Forward Citations = 49(Granted Patents)


Company Filing History:


Years Active: 2003-2006

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5 patents (USPTO):Explore Patents

Title: Innovations by Inventor Ravi Chandran

Introduction

Ravi Chandran is a notable inventor based in New Brunswick, NJ (US). He has made significant contributions to the field of surface treatment technologies, holding a total of 5 patents. His work focuses on enhancing the properties of conductive surfaces through innovative processes.

Latest Patents

Ravi's latest patents include an "Energy enhanced process for treating a conductive surface and products formed thereby." This patent describes a method for forming a deposit on metallic or conductive surfaces using an energy-enhanced process to apply a silicate-containing coating or film. Another significant patent is the "Process for treating a conductive surface and products formed thereby," which outlines an electrolytic process for depositing a silicate coating on conductive surfaces.

Career Highlights

Ravi Chandran is currently associated with Elisha Holding LLC, where he continues to develop and refine his innovative processes. His expertise in surface treatment has positioned him as a valuable asset in his field.

Collaborations

Ravi has collaborated with notable professionals such as Robert L Heimann and William M Dalton, contributing to advancements in their shared areas of expertise.

Conclusion

Ravi Chandran's innovative work in surface treatment technologies has led to multiple patents that enhance the functionality of conductive surfaces. His contributions continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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