Oulu, Finland

Rauli Virkkala

This inventor holds 1 USPTO granted patent. Top assignee: Valmet Automation. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rauli Virkkala. Retrieved from https://idiyas.com/inventor/rauli-virkkala

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Rauli Virkkala: Innovator in Gas Content Measurement

Introduction

Rauli Virkkala is a notable inventor based in Oulu, Finland. He has made significant contributions to the field of gas measurement technology. His innovative approach has led to the development of a unique method for measuring gas content in various fluids.

Latest Patents

Rauli Virkkala holds a patent for a "Method for measuring gas content and a gas content measuring device." This invention pertains to a method for measuring gas content in fluids, such as papermaking pulp or coating paste. The device measures pressure variations generated by a pump in the fluid. It utilizes microwave signals to determine gas content based on changes in travel time, phase, and attenuation caused by these pressure variations.

Career Highlights

Rauli is currently employed at Valmet Automation, where he applies his expertise in gas measurement technology. His work has been instrumental in advancing the capabilities of measurement devices used in industrial applications.

Collaborations

Throughout his career, Rauli has collaborated with notable colleagues, including Pekka Jakkula and Urpo Kasurinen. These partnerships have fostered innovation and contributed to the success of their projects.

Conclusion

Rauli Virkkala's contributions to gas measurement technology exemplify the impact of innovative thinking in industrial applications. His patent and work at Valmet Automation highlight his role as a key figure in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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