This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2007.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2007
Title: Ratnam Sooriyekumaren: Innovator in Silicon-Containing Compositions
Introduction
Ratnam Sooriyekumaren is a notable inventor based in San Jose, CA. He has made significant contributions to the field of materials science, particularly in the development of silicon-containing compositions for lithographic processes. His work has implications for the semiconductor industry, where precision and efficiency are paramount.
Latest Patents
Ratnam holds a patent for "Silicon-containing compositions for spin-on arc/hardmask materials." This invention features antireflective compositions characterized by the presence of an Si-containing polymer with pendant chromophore moieties. These compositions are particularly useful in lithographic processes, providing outstanding optical, mechanical, and etch selectivity properties. They are applicable using spin-on application techniques, making them especially beneficial for configuring underlying material layers on substrates, such as metal or semiconductor layers.
Career Highlights
Ratnam Sooriyekumaren is associated with International Business Machines Corporation (IBM), where he has been instrumental in advancing technologies related to his patent. His expertise in materials science has positioned him as a valuable asset in the research and development sector of the company.
Collaborations
Some of Ratnam's coworkers include Dirk Pfeiffer and Wu-Song S Huang. Their collaborative efforts contribute to the innovative environment at IBM, fostering advancements in technology and materials.
Conclusion
Ratnam Sooriyekumaren's work in silicon-containing compositions exemplifies the intersection of innovation and practical application in the semiconductor industry. His contributions continue to influence the field, showcasing the importance of research and development in advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
