Saint-Brieuc, France

Ratiba Benzerga

This inventor holds 1 USPTO granted patent. Top assignee: Université De Rennes 1. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ratiba Benzerga. Retrieved from https://idiyas.com/inventor/ratiba-benzerga

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Ratiba Benzerga and Electromagnetic-Wave-Absorbing Materials

Introduction

Ratiba Benzerga is an inventor associated with Saint-Brieuc, France, and Université de Rennes 1. Her patent work concerns composite materials designed to absorb electromagnetic waves.

Latest Patents

Benzerga is credited with 1 patent: “Electromagnetic-wave-absorbing materials for various applications.” The invention describes a composite made from a cork-particle carrier matrix and an electromagnetic-wave-absorbing filler. The material is specified to have a real permittivity greater than 1.2 and a dielectric loss tangent greater than 0.1. The patent also describes a method for producing the material and potential uses, including anechoic chambers, radar-absorbing stealth devices, and improving the electromagnetic compatibility of electronic devices.

Career Highlights

The patent highlights an approach that uses cork as the matrix for an electromagnetic-wave-absorbing composite. Its stated applications span testing environments, stealth technology, and electronic-device compatibility.

Collaborations

Benzerga’s listed coworkers include Chloé Mejean and Ala Sharaiha. Her work is associated with Université de Rennes 1.

Conclusion

Ratiba Benzerga’s patent presents cork-based composite materials as a versatile option for absorbing electromagnetic waves across several technical applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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