Berkshire, United Kingdom

Raphael Rouillon


 

Average Co-Inventor Count = 1.6

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Slough, GB (2020 - 2021)
  • Berkshire, GB (2019 - 2023)

Company Filing History:


Years Active: 2019-2023

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7 patents (USPTO):Explore Patents

Title: Innovations of Raphael Rouillon

Introduction

Raphael Rouillon is a notable inventor based in Berkshire, GB. He has made significant contributions to the field of mechanical engineering, particularly in the development of gas seal systems. With a total of seven patents to his name, Rouillon's work focuses on reducing emissions in mechanical systems.

Latest Patents

One of his latest patents is the Reduced Emission Gas Seal. This innovative dry gas mechanical seal system is designed to inhibit the emission of process gas. The system features tandem first and second stage seals, along with a single separation gas supply subsystem. This subsystem directs a supply of separation gas from an inlet through the interfacing portions of the first stage seal into a process cavity. Additionally, it channels the gas through the second stage seal and out through an outlet to the atmosphere. This design effectively minimizes the emission of process gas between a compressor housing and a rotating compressor shaft.

Career Highlights

Raphael Rouillon is currently employed at John Crane UK Limited, where he continues to develop innovative solutions in mechanical sealing technology. His expertise and dedication to reducing emissions have positioned him as a key figure in his field.

Collaborations

Throughout his career, Rouillon has collaborated with talented professionals such as Ian Martyn Goldswain and Kanza Amanullah. These partnerships have contributed to the advancement of his projects and innovations.

Conclusion

Raphael Rouillon's work exemplifies the importance of innovation in mechanical engineering. His patents, particularly in reducing emissions, highlight his commitment to creating more efficient and environmentally friendly technologies.

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