Vevey, Switzerland

Raoul Baud

This inventor holds 1 USPTO granted patent. Top assignee: Siemens-Albis. Active years: 1981.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Raoul Baud. Retrieved from https://idiyas.com/inventor/raoul-baud

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1981

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1 patent (USPTO):Explore Patents

Title: Raoul Baud - Innovator in Inclinometer Technology

Introduction

Raoul Baud is a notable inventor based in Vevey, Switzerland. He has made significant contributions to the field of measurement technology, particularly with his innovative inclinometer design. His work focuses on enhancing the accuracy and functionality of inclination measurement in various applications.

Latest Patents

Raoul Baud holds a patent for an inclinometer that measures and monitors the degree and orientation of inclination of apparatuses, such as vehicles or cranes, relative to an artificial horizon. This inclinometer features an annular vessel with light-transmissive walls and a hollow ring cover that partially embraces the vessel. The design incorporates light sources and light receivers arranged in pairs to form light barriers that can be interrupted by a liquid contained within the vessel. This innovative approach allows for precise measurement of inclination.

Career Highlights

Raoul Baud is associated with Siemens-Albis, a company known for its advancements in technology and engineering solutions. His work at Siemens-Albis has allowed him to further develop his ideas and contribute to the field of measurement technology.

Conclusion

Raoul Baud's contributions to inclinometer technology exemplify the innovative spirit of modern inventors. His patent reflects a commitment to improving measurement accuracy in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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