Ranshir P S Thakur

Title: Ranshir P S Thakur: Innovator in Semiconductor Technology

Introduction

Ranshir P S Thakur is a notable inventor based in Boise, Idaho, recognized for his contributions to semiconductor technology. He has developed a significant patent that addresses critical challenges in the field of semiconductor fabrication.

Latest Patents

Thakur holds a patent for a "Method for forming a self-aligned T-shaped isolation trench." This invention relates to a method for creating an isolation trench structure in a semiconductor substrate without causing harmful topographical depressions that can lead to current and charge leakage in adjacent active areas. The method involves several steps, including the formation of a pad oxide on a semiconductor substrate, followed by the application of a nitride layer. The nitride layer is then patterned and etched to expose parts of the pad oxide while protecting the active areas. A second dielectric layer is formed, and a spacer etch is performed to create a spacer from this layer. An isolation trench etch follows, with optional thermal oxidation and doping to enhance isolation between neighboring active regions. The process concludes with the formation of a conformal layer and planarization, resulting in a structure with a unique flange and shaft design.

Career Highlights

Ranshir P S Thakur is currently employed at Micron Technology Incorporated, a leading company in the semiconductor industry. His work focuses on innovative methods that improve semiconductor manufacturing processes and enhance device performance.

Collaborations

Thakur has collaborated with notable colleagues, including Fernando N Gonzalez and David L Chapek, contributing to advancements in semiconductor technology through teamwork and shared expertise.

Conclusion

Ranshir P S Thakur's innovative work in semiconductor technology, particularly his patented method for forming isolation trenches, showcases his significant contributions to the field. His career at Micron Technology Incorporated and collaborations with esteemed colleagues further highlight his impact on advancing semiconductor manufacturing processes.