This inventor holds 1 USPTO granted patent. Top assignees: Nantong Textile & Silk Ind Tech Res Inst, Soochow University. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: The Innovative Contributions of Ranran Li
Introduction
Ranran Li is a notable inventor based in Suzhou, China. He has made significant contributions to the field of material science, particularly in the development of protective masks. His innovative approach combines advanced materials to enhance safety and functionality.
Latest Patents
Ranran Li holds a patent for an anti-propylene mask and the method for its preparation. This mask is designed to prevent propylene from entering the human body through respiratory organs. The construction of the mask includes a fiber cloth contact layer, an antistatic non-woven fabric layer, and a fullerene/nano titanium dioxide spunbond layer. The spunbond layer is created by bonding modified resin materials, which consist of matrix resin, carboxylated fullerene derivatives, nano titanium dioxide, a lubricant, and a coupling agent. The preparation method involves mixing and reacting the carboxylated fullerene derivative with nano titanium dioxide to create a modified compound, which is then blended with the other components. This innovative mask demonstrates a strong anti-propylene effect.
Career Highlights
Throughout his career, Ranran Li has worked with reputable organizations such as the Nantong Textile & Silk Industry Technology Research Institute and Soochow University. His experience in these institutions has allowed him to refine his skills and contribute to significant advancements in textile technology and material science.
Collaborations
Ranran Li has collaborated with talented individuals in his field, including Yuqing Liu and Jing Hu. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Ranran Li's contributions to the development of protective masks highlight his innovative spirit and dedication to improving safety through advanced materials. His work continues to influence the field and inspire future inventions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile