Company Filing History:
Years Active: 2012
Title: Innovations of Randolph E Truer
Introduction
Randolph E Truer is an accomplished inventor based in San Luis Obispo, California. He has made significant contributions to the field of technology, particularly in the area of chemical mechanical polishing (CMP) systems. His innovative work has led to the development of a unique patent that enhances the efficiency of polishing processes.
Latest Patents
Randolph E Truer holds a patent for a CMP system with a wireless endpoint detection system. This invention features a CMP polishing pad that incorporates an optical sensor assembly embedded within the pad. The sensor is connected to a transceiver and/or power supply, which can be mounted at the center or outer edge of the pad. This system communicates wirelessly with a control system, allowing for improved monitoring and control during the polishing process. He has 1 patent to his name.
Career Highlights
Randolph is currently employed at Strasbaugh, a company known for its advanced semiconductor manufacturing equipment. His role at Strasbaugh has allowed him to apply his innovative ideas and contribute to the development of cutting-edge technologies in the industry.
Collaborations
Throughout his career, Randolph has worked alongside talented professionals, including his coworker Michael Starman. Their collaboration has fostered an environment of creativity and innovation, leading to advancements in CMP technology.
Conclusion
Randolph E Truer's contributions to the field of CMP systems exemplify the spirit of innovation. His patented technology not only enhances the efficiency of polishing processes but also showcases his commitment to advancing the industry.