Irvine, CA, United States of America

Randall W Kautz

This inventor holds 8 USPTO granted patents. Top assignees: Morton International, Inc., Shipley Company LLC. Active years: 1993-2005.


% Patents Active = 87.5

Average Co-Inventor Count = 2.8

ph-index = 5

Forward Citations = 66(Granted Patents)


Company Filing History:


Years Active: 1993-2005

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8 patents (USPTO):Explore Patents

Title: The Innovations of Randall W. Kautz

Introduction

Randall W. Kautz is a notable inventor based in Irvine, CA, with a significant contribution to the field of photoresist compositions. He holds 8 patents that showcase his expertise and innovative spirit. His work primarily focuses on improving the properties of photoimageable compositions used in manufacturing printed wiring boards.

Latest Patents

Kautz's latest patents include advancements in photoresist compositions that exhibit improved stripping properties. One of his notable inventions is a negative-acting photoimageable composition that comprises an acid-functional binder polymer, a photopolymerizable component, and a photoinitiator chemical system. This innovative binder polymer features a multi-modal molecular weight distribution, which promotes faster photoresist stripping times and results in a smaller stripped particle size. The combination of these features allows for fully aqueous and environmentally friendly stripping of the photoresist from overplated circuit boards.

Career Highlights

Throughout his career, Kautz has worked with prominent companies such as Morton International, Inc. and Shipley Company LLC. His experience in these organizations has contributed to his development of cutting-edge technologies in the field of photoresists.

Collaborations

Kautz has collaborated with several professionals in his field, including Charles R. Keil and James J. Briguglio. These collaborations have further enhanced his innovative capabilities and have led to significant advancements in his work.

Conclusion

Randall W. Kautz is a distinguished inventor whose contributions to photoresist compositions have made a lasting impact on the industry. His innovative patents and collaborations reflect his commitment to advancing technology in this field.

Profile summary based on public USPTO records.
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