Randall Clark

Title: Innovations of Randall Clark: A Pioneer in Gas Dispersion Technology

Introduction: Randall Clark is an accomplished inventor based in Colchester, Vermont. He has made significant contributions to the field of gas deposition technology. His innovative approach has led to the development of a unique gas dispersion shield method.

Latest Patents: Randall Clark holds a patent for a gas dispersion shield method. This invention is designed to protect the bottom surface of a gas deposition chamber while injecting gas from a gas insertion channel at a non-vertical angle. The gas dispersion shield features a cylindrically shaped vertical sidewall, an annular flange extending horizontally and outwardly from the sidewall's upper end, and a horizontal wall that extends inwardly from the sidewall's lower end. The flange includes a top surface, a bottom surface, and multiple holes formed through it, each extending in a non-vertical direction. The bottom surface has an annular protrusion that fits partially into the gas insertion channel, ensuring that gas flows through the non-vertical holes instead of escaping around the flange.

Career Highlights: Randall Clark is associated with Pentagon Technologies Group, Inc., where he continues to innovate and develop advanced technologies in gas deposition. His work has been instrumental in enhancing the efficiency and effectiveness of gas deposition processes.

Conclusion: Randall Clark's contributions to gas dispersion technology exemplify his commitment to innovation and excellence in his field. His patent for the gas dispersion shield method showcases his ability to solve complex problems in gas deposition chambers.