Chandler, AZ, United States of America

Rand A Conner

This inventor holds 1 USPTO granted patent. Top assignee: Advanced Semiconductor Materials America, Inc.. Active years: 1992.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: Rand A Conner: Innovator in Plasma Technology

Introduction

Rand A Conner is a notable inventor based in Chandler, AZ (US). He has made significant contributions to the field of semiconductor materials and plasma technology. His innovative work has led to the development of a patent that enhances the efficiency of power transfer in chemical vapor deposition systems.

Latest Patents

Rand A Conner holds a patent for a transmission line designed to provide power to an electrode boat in a plasma. This transmission line is constructed from ceramic and nickel materials, allowing it to match the characteristic impedance of a boat assembly in a chemical vapor deposition system. The design interposes the transmission line between a set of feedthroughs through the wall of a reactant tube and a set of contacts on the boat assembly. This innovation improves the efficiency of power transfer from an RF power source external to the reactant tube, particularly at high frequencies such as 13.56 MHz. The result is enhanced repeatability in the deposition of film on wafers within the boat assembly.

Career Highlights

Rand A Conner is associated with Advanced Semiconductor Materials America, Inc., where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the capabilities of chemical vapor deposition systems, which are critical in the manufacturing of semiconductor devices.

Collaborations

Rand has collaborated with notable colleagues, including Michael R Bonsaver and David P Lambert. Their combined efforts contribute to the innovative advancements in the field of semiconductor materials.

Conclusion

Rand A Conner's contributions to plasma technology and semiconductor materials have made a significant impact in the industry. His innovative patent demonstrates his commitment to improving efficiency in chemical vapor deposition systems.

Profile summary based on public USPTO records.
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