Ramya Ramalingam

Title: The Innovations of Ramya Ramalingam: A Trailblazing Inventor in EUV Technology

Introduction

Ramya Ramalingam is a distinguished inventor based in Singapore, known for her groundbreaking work in extreme ultraviolet (EUV) technology. With a total of two patents to her name, she has significantly contributed to advancements in the field. Her innovative spirit and technical prowess have made her a valuable asset in the realm of semiconductor manufacturing.

Latest Patents

Ramya's latest patents focus on crucial aspects of EUV mask technology. One patent addresses Extreme ultraviolet mask absorber materials, where she introduces methods for the manufacture of EUV mask blanks. These mask blanks consist of a substrate, a multilayer stack of reflective layers, a capping layer on the reflective layers, and an absorber layer made from antimony and nitrogen. This innovative design enhances the efficiency of EUV lithography.

Her second patent concerns EUV mask blank absorber defect reduction. This patent outlines methods for coating EUV reticle carrier assemblies to minimize particle defects in EUV mask blank manufacturing. By depositing an adhesion layer, an EUV absorber layer, and a stress-relieving layer on the reticle carrier assembly, her methods have demonstrated a reduction in particle defect generation, significantly benefiting the production process.

Career Highlights

Ramya Ramalingam is currently employed at Applied Materials, Inc., a leading company in the development of advanced manufacturing technologies. Within this role, she has made a substantial impact on EUV technology, further solidifying her reputation as a leading inventor in her field.

Collaborations

Throughout her career, Ramya has collaborated with talented professionals, including her coworkers Vibhu Jindal and Azeddine Zerrade. Their collective expertise and innovative approaches have contributed to the successful development of her patented technologies.

Conclusion

Ramya Ramalingam's contributions to EUV technology exemplify the power of innovation and collaboration in advancing manufacturing processes. Her patents not only showcase her technical skills but also highlight her commitment to pushing the boundaries of what is possible in the semiconductor industry. As she continues to innovate, the impact of her work is expected to resonate throughout the industry for years to come.