Madrid, Spain

Ramon Yepes Segovia

This inventor holds 1 USPTO granted patent. Top assignee: Lectra. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ramon Yepes Segovia. Retrieved from https://idiyas.com/inventor/ramon-yepes-segovia

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Ramon Yepes Segovia: Innovator in Garment Grading Technology

Introduction

Ramon Yepes Segovia is a notable inventor based in Madrid, Spain. He has made significant contributions to the field of garment grading technology. His innovative approach has led to the development of a unique method that automates the grading of articles, particularly garments.

Latest Patents

Ramon Yepes Segovia holds a patent for a "Method of automatically grading articles, in particular, garments." This patent describes a grading mask that utilizes images of reference article pieces and geometrical grading regions. Each region contains characteristic points and associated grading formulae. The method allows for the automatic grading of garments based on a chosen scale of measurements, enhancing efficiency in the garment industry.

Career Highlights

Ramon is currently employed at Lectra, a company known for its cutting-edge technology in the fashion and textile industry. His work focuses on improving garment production processes through innovative solutions. His expertise in garment grading has positioned him as a valuable asset in his field.

Collaborations

Ramon collaborates with Maria De Los Angeles Encinas Arias, contributing to advancements in garment technology. Their partnership exemplifies the importance of teamwork in driving innovation.

Conclusion

Ramon Yepes Segovia's contributions to garment grading technology reflect his dedication to innovation. His patented method showcases the potential for automation in the fashion industry, paving the way for more efficient production processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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