Ramon R Collazo

Title: Ramon R Collazo: Innovator in Aluminum Nitride Substrates

Introduction

Ramon R Collazo is a notable inventor based in Raleigh, NC (US). He has made significant contributions to the field of materials science, particularly in the development of methods for protecting aluminum nitride substrates. With a total of 3 patents to his name, Collazo's work is recognized for its innovative approaches and practical applications.

Latest Patents

One of Collazo's latest patents focuses on the passivation of aluminum nitride substrates. This invention provides methods for protecting the surface of aluminum nitride substrates, allowing them to be stored for extended periods while remaining ready for thin film growth or other processing. The method involves forming a passivating layer on at least a portion of the substrate surface through a wet etch process, which may utilize various organic compounds and acids. This advancement not only enhances the durability of the substrates but also facilitates their activation for subsequent applications.

Career Highlights

Collazo is affiliated with North Carolina State University, where he continues to engage in research and development. His work has garnered attention for its potential impact on various technological applications, particularly in electronics and materials engineering.

Collaborations

Collazo has collaborated with esteemed colleagues such as Zlatko Sitar and Rafael F Dalmau. These partnerships have contributed to the advancement of research in the field and have fostered a collaborative environment for innovation.

Conclusion

Ramon R Collazo stands out as a key figure in the innovation of aluminum nitride substrates. His patents reflect a commitment to advancing materials science and enhancing the functionality of electronic components. Through his work, Collazo continues to influence the landscape of technology and research.