Barcelona, Spain

Ramon Castells

This inventor holds 2 USPTO granted patents. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2015-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ramon Castells. Retrieved from https://idiyas.com/inventor/ramon-castells

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015-2016

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2 patents (USPTO):Explore Patents

Title: Ramon Castells: Innovator in Printing Technology

Introduction

Ramon Castells is a notable inventor based in Barcelona, Spain. He has made significant contributions to the field of printing technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and functionality of printing processes.

Latest Patents

Among his latest patents, one is titled "Spindle." In this embodiment, a roll spindle comprises two roll supports and a differential. Another patent is "Collect Print Substance," which describes an arrangement or method for collecting and heating print substance that passes through porous media in a printer. These innovations reflect his commitment to advancing printing technology.

Career Highlights

Ramon Castells is currently employed at Hewlett-Packard Development Company, L.P. His role at this leading technology company allows him to work on cutting-edge projects that push the boundaries of printing solutions.

Collaborations

He has collaborated with talented coworkers, including Antonio Monclus and Jose Antonio Alvarez Tapia. Their combined expertise contributes to the innovative environment at Hewlett-Packard.

Conclusion

Ramon Castells is a prominent figure in the realm of printing technology, with a focus on developing innovative solutions that enhance printing processes. His contributions and collaborations continue to shape the future of the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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