Ramiel Oshana

Title: The Innovative Contributions of Ramiel Oshana

Introduction

Ramiel Oshana is a notable inventor based in San Jose, California. He has made significant contributions to the field of polishing technology, holding two patents that showcase his innovative approach. His work primarily focuses on enhancing the efficiency and effectiveness of polishing processes.

Latest Patents

Oshana's latest patents include a "Method of making and apparatus having polishing pad with window." This invention features a polishing layer that incorporates a window member, strategically positioned a predetermined distance below the polishing surface. Additionally, a transparent layer can be placed beneath the polishing layer to support the window member. Another patent, titled "Polishing pad with window," shares similar attributes, emphasizing the importance of the window member in the polishing process.

Career Highlights

Ramiel Oshana is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His role at the company allows him to apply his inventive skills to develop advanced technologies that improve manufacturing processes.

Collaborations

Throughout his career, Oshana has collaborated with talented individuals such as Andreas Norbert Wiswesser and Kerry F Hughes. These partnerships have likely contributed to the innovative solutions he has developed in his field.

Conclusion

Ramiel Oshana's contributions to polishing technology through his patents reflect his dedication to innovation. His work at Applied Materials, Inc. and collaborations with other professionals further enhance his impact in the industry.