The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2007
Filed:
Sep. 23, 2003
Applicants:
Andreas Norbert Wiswesser, Freiberg, DE;
Ramiel Oshana, San Jose, CA (US);
Kerry F. Hughes, San Francisco, CA (US);
Jay Rohde, San Jose, CA (US);
David Datong Huo, Campell, CA (US);
Dominic J. Benvegnu, La Honda, CA (US);
Inventors:
Andreas Norbert Wiswesser, Freiberg, DE;
Ramiel Oshana, San Jose, CA (US);
Kerry F. Hughes, San Francisco, CA (US);
Jay Rohde, San Jose, CA (US);
David Datong Huo, Campell, CA (US);
Dominic J. Benvegnu, La Honda, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 49/12 (2006.01);
U.S. Cl.
CPC ...
Abstract
A polishing layer of a polishing has a window member with a top surface positioned a predetermined distance below the polishing surface. A transparent layer can be positioned below the polishing layer and supporting the window member.