Munster, IN, United States of America

Ramchandra S Patil

This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignee: Ispat Inland, Inc.. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ramchandra S Patil. Retrieved from https://idiyas.com/inventor/ramchandra-s-patil

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Innovations of Ramchandra S Patil

Introduction

Ramchandra S Patil is an accomplished inventor based in Munster, IN (US). He has made significant contributions to the field of galvanizing and galvannealing processes. His innovative methods have the potential to enhance the efficiency and quality of metal treatment.

Latest Patents

One of his notable patents is titled "Method for galvanizing and galvannealing employing a bath of zinc and aluminum." This patent discloses a method for hot-dip galvanizing and galvannealing that utilizes a bath of zinc and aluminum. The process involves immersing strips in the bath to produce substantially dross-free galvannealed and galvanized strips. The bath maintains a consistent effective aluminum concentration during both galvanizing and galvannealing, with a temperature set-point of approximately 440°C to 450°C.

Career Highlights

Ramchandra S Patil is associated with Ispat Inland, Inc., where he applies his expertise in metal treatment technologies. His work has contributed to advancements in the industry, particularly in improving the quality of galvanized products.

Collaborations

He has collaborated with Pertti Sippola, further enhancing the innovative processes within their field.

Conclusion

Ramchandra S Patil's contributions to galvanizing and galvannealing processes demonstrate his commitment to innovation in metal treatment technologies. His patent reflects a significant advancement that could benefit various industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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