Scott Valley, CA, United States of America

Ramana Veerasingam


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 27(Granted Patents)


Company Filing History:


Years Active: 2003

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Ramana Veerasingam: Innovator in Plasma Processing Technology

Introduction

Ramana Veerasingam is a notable inventor based in Scott Valley, California. He has made significant contributions to the field of plasma processing technology, particularly in enhancing the efficiency of chemical vapor deposition (CVD) processes. His innovative approach addresses critical challenges in substrate processing.

Latest Patents

Ramana holds a patent titled "Reduction of plasma edge effect on plasma enhanced CVD processes." This invention involves an apparatus designed to confine plasma within a process zone of a substrate processing chamber. The apparatus features an annular member with an upper mounting surface, an inner confinement wall, and an outer confinement wall. It is strategically connected to a gas distribution assembly to mitigate plasma edge effects on the substrate surface. The design includes a plasma choke aperture that minimizes the process zone volume around the substrate's periphery, effectively eliminating uneven material deposition.

Career Highlights

Ramana Veerasingam is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work focuses on advancing technologies that improve manufacturing processes and product quality. With a patent portfolio that includes one patent, he has established himself as a key contributor to innovation in his field.

Collaborations

Throughout his career, Ramana has collaborated with esteemed colleagues such as Kuo-Shih Liu and Zhi Xu. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise, further enhancing the development of innovative solutions in plasma processing.

Conclusion

Ramana Veerasingam's contributions to plasma processing technology exemplify the impact of innovation in the semiconductor industry. His patented apparatus addresses significant challenges in substrate processing, showcasing his commitment to advancing technology. His work at Applied Materials, Inc. continues to influence the field positively.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…