Applied Materials, Inc.

Ramana Veerasingam

Mario Dave Silvetti

Ping Xu

Kuo-Shih Liu

Zhi Xu

Gang Chen

An appparatus for confining plasma within a process zone of a substrate processing chamber. In one aspect, an apparatus comprises an annular member having an upper mounting surface, an inner confinement wall, and an outer confinement wall. The apparatus is disposed on or otherwise connected to a gas distribution assembly of the processing chamber to prevent plasma edge effects on the surface of a substrate. The apparatus provides a plasma choke aperture that reduces the volume of the process zone around the periphery of the substrate thereby eliminating uneven deposition of material around the edge of the substrate.

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Scott Valley, CA, United States of America

Ramana Veerasingam