Location History:
- Speyer, DE (2011)
- Eppelsheim, DE (2012)
Company Filing History:
Years Active: 2011-2012
Title: Ralph Versch: Innovator in Distillation Processes
Introduction
Ralph Versch is a notable inventor based in Eppelsheim, Germany. He has made significant contributions to the field of chemical engineering, particularly in the area of distillation processes. With a total of 4 patents to his name, Versch has developed innovative methods that enhance the efficiency of separating chemical mixtures.
Latest Patents
Versch's latest patents focus on the continuous separation by distillation of mixtures containing morpholine (MO), monoaminodiglycol (ADG), ammonia, and water. One of his key inventions outlines a process for the continuous fractional distillation of these mixtures, which includes several steps. The process begins with the separation of ammonia from the mixture at the top of a first distillation column. Subsequently, a bottom fraction is fed into a second distillation column, where water and organic products are separated at specific temperature and pressure ranges. The method continues with further separation in a third and fourth distillation column, ensuring the effective extraction of morpholine and other organic products.
Career Highlights
Ralph Versch is currently employed at BASF SE Corporation, a leading global chemical company. His work at BASF has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in chemical processing technologies. His expertise in distillation processes has positioned him as a valuable asset within the company.
Collaborations
Versch has collaborated with notable colleagues, including Helmut Schmidtke and Oliver Buβmann. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Ralph Versch is a distinguished inventor whose work in distillation processes has made a significant impact in the field of chemical engineering. His innovative patents and collaborations with esteemed colleagues highlight his commitment to advancing technology in this area.
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